Equipment type and purpose
Equipment type: RF Generator produced by Advanced Energy (AE)
Main purpose:
Semiconductor manufacturing: used for plasma generation and control, supporting processes such as etching and deposition.
Other industrial scenarios: photovoltaic production lines, panel production lines, industrial glass coating, etc.
Technical Parameter
Parameter values
Frequency 13.56MHz
Output power 3000W
Power supply voltage 200V-208VCooling method: Water cooling
Control mode fully digital control, supporting frequency tuning, pulse and pulse synchronization

Characteristics and advantages
High precision and stability: Provides stable and precise RF power output, ensuring controllability and consistency of plasma reactions.
Programmable and flexible: allows for adjusting parameters according to different process requirements and adapting to different manufacturing steps.
Integration and Communication Capability: Supports communication with factory automation systems for easy monitoring and control.
Safety features: including overload protection, short circuit protection and other safety mechanisms to ensure the safety of operators and equipment.

application area
Semiconductor manufacturing: plasma generation and control.
Photovoltaic production line: supports the manufacturing process of photovoltaic cells.
Panel production line: used for plasma technology in display screen manufacturing.
Industrial glass coating: Provides stable RF power output to ensure coating quality.